Nordic Nanolab Network Webinar
Maskless Aligner Systems (MLA)
10 – 11 May 2021
The Nordic Nanolab Network invites all users to its first topical webinar with four tutorials on maskless aligner systems
Introduction: Thomas Swahn, Myfab
Monday 10 May: 09:00 – 10:00: Basic operation of MLA tools
Chair Leif S. Johansen DTU Nanolab. Presenter: Jens Hemmingsen DTU Nanolab
o Principle of operation
o From design to pattern
o Alignment modes
10:00 – 10:30 Discussion – please use the Q&A tab
Presentation can be downloaded here
10:30 – 11:30: Advanced features and possibilities of MLA tools
Chair Leif S. Johansen DTU Nanolab. Presenter: Jens Hemmingsen DTU Nanolab
o Advantages/limitations: Conversion PC, write modes, high aspect ratio (add-on features)
o Tradeoffs during specification and purchasing
o Optical proximity correction (OPC)
11:30 – 12:00 Discussion – please use the Q&A tab
Presentation can be downloaded here
Tuesday 11 May: 09:00 – 10:00: Grey scale lithography
Chair Thomas Swahn, Myfab. Presenter Jens Høvik, NorFab NTNU
o Fundamental grey scale lithography
o “Mask” preparation
o Grey scale lithography on MLA 100 and 150
o Post processing: reflow etc.
10:00 – 10:30 Discussion – please use the Q&A tab
Presentation can be downloaded here
10:30 – 11:30: Beyond MLA
Chair, Ivan Maximov Myfab Lund
o Block Copolymer Lithography, BCP, Presenter Ivan Maximov Myfab Lund
Presentation can be downloaded here
o Displacement Talbot Lithography, DTL. Presenter Sarah McKibbin, Myfab Lund
Presentation can be downloaded here
o Adhesion lithography. Presenter Sihai Luo, NorFab NTNU
Presentation can be downloaded here. Video1 Video2
o Cross exposure with dipole illumination using DUV stepper. Presenter Matthias Keil, DTU Nanolab
Presentation can be downloaded here
11:30 – 12:00 Discussion – please use the Q&A tab and wrap-up. The Q&A session will be combined for the four presentations
Wrap-up: Thomas Swahn, Myfab